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+44 (0) 7525 747 884

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+44 (0) 7525 747 884

Ortus 1100 Vacuum System

Ortus 1100

Substrate holder: Dome ø995 mm, Planetary 4x ø387 mm. Automatic Optical Monitoring, Two E-guns, Two Resistance evap., RF Plasma Assist Source.

For production companies in the need of higher production capacities.
Suitable for coatings on 3D shaped substrates.

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Configuration Options:

1. Substrate Holder

Ortus 1100 Vacuum System Technical Spec

2. Technological Devices​

  • Electron Beam Evaporation (EBE)

    • 3 different sizes EV M-6, EV M-8, EV M-10

    • Customized crucibles, 1 ... 12 pockets

    • Max. quantity : 2 pcs

  • Cleaning and Assistance sources

    • Accelerator with anode Layer (Ion Current Density up to 4.2 mA/cm^2)

    • Copra: RF Plasma Assist Source (Ion Current Density up to 2.5 mA/cm^2)

    • Max. quantity : 1 pcs

  • Resistance evaporation source

    • Max. quantity : 2 pcs together with 2 EBE

3. Coating Process Control

  • Rate and thickness control system (quartz control)

  • Optical process monitoring system OCP

    • OCP Singlewave for monochromatic monitoring.

4. Accessories

  • Substrate heating system

    • IR lamps

    • Tubular heater

Other Ortus Models

Ortus 1500 Vacuum System

Ortus 1500

Substrate holder: Dome ø1390 mm,

Planetary 4x ø590 mm.

Automatic Optical Monitoring.

2xE-gun, 2xResistance evap,

RF Plasma Assist Source

Ortus 900 Vacuum System

Ortus 900

Substrate holder: Dome ø800 mm,

Planetary 4x ø327 mm.

Automatic Optical Monitoring.

2xE-gun, Resistance evap, End hall assist, RF Plasma Assist Source.

Ortus 700 Vacuum System

Ortus 700

Substrate holder: Dome ø620 mm, Planetary 3x ø250 mm.

Automatic Optical Monitoring.

2xE-gun, Resistance evap., End hall assist, RF Plasma Assist Source.

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