Ortus 700
Substrate holder: Dome ø620 mm, Planetary 3x ø250 mm. Automatic Optical Monitoring, Two E-guns, Resistance evap., End hall assist and RF Plasma Assist Source.
The most compact PIAD coater provides all flexibility of ORTUS platform with options in technologycal devices, substrate holders, process control and accessories.
With dome diameter of 620 mm and possibility to install other substrate holders it is optimized for R&D and small scale production.
Configuration Options:
1. Substrate Holder
2. Technological Devices​
-
Electron Beam Evaporation (EBE)
-
3 different sizes EV M-6, EV M-8, EV M-10
-
Customized crucibles, 1 ... 12 pockets
-
Max. quantity : 2 pcs
-
-
Cleaning and Assistance sources
-
End-Hall ion source with Ion Current Density up to 1 mA/cm^2
-
Accelerator with anode Layer (Ion Current Density up to 4.2 mA/cm^2)
-
Copra: RF Plasma Assist Source (Ion Current Density up to 2.5 mA/cm^2)
-
Max. quantity : 1 pcs
-
-
Resistance evaporation source
-
Max. quantity : 1 pcs together with 2 EBE
-
3. Coating Process Control
-
Rate and thickness control system (quartz control)
-
Optical process monitoring system OCP
-
OCP Singlewave for monochromatic monitoring.
-
4. Accessories
-
Substrate heating system
-
IR lamps
-
Tubular heater
-
Other Ortus Models
Let's Find the Right System For Your Application
Our team will help you identify the ideal system configuration to meet your process requirements and production goals. With expert technical guidance from initial specification through installation and ongoing support, we ensure your system is configured to deliver the performance you need.
Why Choose EVAP?
✔ Over Three Decades of Combined Experience
✔ UK-Based Engineering Support
✔ Official UK Partner for UAB I-Photonics
✔ Comprehensive Aftercare & Maintenance
✔ OEM Parts & Technical Support
✔ Long-Term Engineering Partnership